Invention Grant
US08574448B2 Plasma generation method, cleaning method, and substrate processing method 有权
等离子体产生方法,清洗方法和基板处理方法

Plasma generation method, cleaning method, and substrate processing method
Abstract:
A plasma generation method in a toroidal plasma generator that includes a gas passage having a gas entrance and a gas outlet and forming a circuitous path and a coil wound around a part of the gas passage includes the steps of supplying a mixed gas of an Ar gas and an NF3 gas containing at least 5% of NF3 and igniting plasma by driving the coil with a high-frequency power, wherein the plasma ignition step is conducted under a total pressure of 6.65-66.5 Pa.
Information query
Patent Agency Ranking
0/0