Invention Grant
- Patent Title: Surface pairs
- Patent Title (中): 表面对
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Application No.: US11667882Application Date: 2005-11-17
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Publication No.: US08574663B2Publication Date: 2013-11-05
- Inventor: Avto Tavkhelidze , Misha Vepkhvadze
- Applicant: Avto Tavkhelidze , Misha Vepkhvadze
- Applicant Address: GI
- Assignee: Borealis Technical Limited
- Current Assignee: Borealis Technical Limited
- Current Assignee Address: GI
- International Application: PCT/US2005/042093 WO 20051117
- International Announcement: WO2006/055890 WO 20060526
- Main IPC: B05D5/12
- IPC: B05D5/12

Abstract:
The present invention is a method for fabricating an electrode pair precursor which comprises the steps of creating on one surface of a substrate one or more indents of a depth less than approximately 10 nm and a width less than approximately 1 μm; depositing a layer of material on the top of this structured substrate to forming a first electrode precursor; depositing another layer the first electrode precursor to form a second electrode precursor; and finally forming a third layer on top of the second electrode precursor.
Public/Granted literature
- US20080003415A1 Surface Pairs Public/Granted day:2008-01-03
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