Invention Grant
- Patent Title: Dual tone development with a photo-activated acid enhancement component in lithographic applications
- Patent Title (中): 在光刻应用中具有光激活酸增强组分的双音发展
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Application No.: US12636211Application Date: 2009-12-11
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Publication No.: US08574810B2Publication Date: 2013-11-05
- Inventor: Carlos A. Fonseca , Mark Somervell , Steven Scheer , Wallace P. Printz
- Applicant: Carlos A. Fonseca , Mark Somervell , Steven Scheer , Wallace P. Printz
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Wood, Herron & Evans, LLP
- Main IPC: G03F7/26
- IPC: G03F7/26 ; G03F7/20
Abstract:
A method and system for patterning a substrate using a lithographic process, such as a dual tone development process, is described. The method comprises use of at least one photo-activated acid enhancement component to improve process latitude for the dual tone development process.
Public/Granted literature
- US20100273107A1 Dual tone development with a photo-activated acid enhancement component in lithographic applications Public/Granted day:2010-10-28
Information query
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