Invention Grant
- Patent Title: Resist composition and method for producing resist pattern
- Patent Title (中): 抗蚀剂组合物和抗蚀剂图案的制造方法
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Application No.: US13404049Application Date: 2012-02-24
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Publication No.: US08574812B2Publication Date: 2013-11-05
- Inventor: Koji Ichikawa , Satoshi Yamaguchi
- Applicant: Koji Ichikawa , Satoshi Yamaguchi
- Applicant Address: JP Tokyo
- Assignee: Sumitomo Chemical Company, Limited
- Current Assignee: Sumitomo Chemical Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2011-039459 20110225
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/30 ; G03F7/38 ; G03F7/039
Abstract:
A resist composition of the invention includes: (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and (B) an acid generator represented by the formula (II), wherein R1, A1, R2, Q1, Q2, L1, ring W1, and Z+ are defined in the specification.
Public/Granted literature
- US20120219906A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN Public/Granted day:2012-08-30
Information query
IPC分类:
