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US08575008B2 Post-fabrication self-aligned initialization of integrated devices 有权
集成器件的后置自对准初始化

Post-fabrication self-aligned initialization of integrated devices
Abstract:
Creating a localized region of material having a target chemical composition by defining an electrical circuit on a substrate, and depositing on the electrical circuit one or more layers of materials having one or more chemical compositions. An electrical current pulse is applied to the electrical circuit to create a self-aligned localized region having the target chemical composition. Applying the electrical current pulse causes a portion of the one or more layers of materials to be heated, resulting in the target chemical composition.
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