Invention Grant
US08575686B2 Nonvolatile semiconductor memory transistor, nonvolatile semiconductor memory, and method for manufacturing nonvolatile semiconductor memory
有权
非易失性半导体存储晶体管,非易失性半导体存储器和用于制造非易失性半导体存储器的方法
- Patent Title: Nonvolatile semiconductor memory transistor, nonvolatile semiconductor memory, and method for manufacturing nonvolatile semiconductor memory
- Patent Title (中): 非易失性半导体存储晶体管,非易失性半导体存储器和用于制造非易失性半导体存储器的方法
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Application No.: US13114681Application Date: 2011-05-24
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Publication No.: US08575686B2Publication Date: 2013-11-05
- Inventor: Fujio Masuoka , Hiroki Nakamura
- Applicant: Fujio Masuoka , Hiroki Nakamura
- Applicant Address: SG Peninsula Plaza
- Assignee: Unisantis Electronics Singapore Pte Ltd.
- Current Assignee: Unisantis Electronics Singapore Pte Ltd.
- Current Assignee Address: SG Peninsula Plaza
- Agency: Brinks Hofer Gilson & Lione
- Priority: JP2010-133057 20100610
- Main IPC: H01L29/66
- IPC: H01L29/66

Abstract:
A nonvolatile semiconductor memory transistor included in a nonvolatile semiconductor memory includes an island-shaped semiconductor having a source region, a channel region, and a drain region formed in this order from the substrate side, a hollow pillar-shaped floating gate arranged so as to surround the outer periphery of the channel region in such a manner that a tunnel insulating film is interposed between the floating gate and the channel region, and a hollow pillar-shaped control gate arranged so as to surround the outer periphery of the floating gate in such a manner that an inter-polysilicon insulating film is interposed between the control gate and the floating gate. The inter-polysilicon insulating film is arranged so as to be interposed between the floating gate and the upper, lower, and inner side surfaces of the control gate.
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