Invention Grant
- Patent Title: Lithographic apparatus and method
- Patent Title (中): 平版印刷设备和方法
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Application No.: US12393805Application Date: 2009-02-26
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Publication No.: US08576374B2Publication Date: 2013-11-05
- Inventor: Keith Frank Best , Henricus Wilhelmus Maria Van Buel , Cheng-Qun Gui , Johannes Onvlee , Rudy Jan Maria Pellens , Remi Daniel Marie Edart , Oleg Viacheslavovich Voznyi , Pascale Anne Maury
- Applicant: Keith Frank Best , Henricus Wilhelmus Maria Van Buel , Cheng-Qun Gui , Johannes Onvlee , Rudy Jan Maria Pellens , Remi Daniel Marie Edart , Oleg Viacheslavovich Voznyi , Pascale Anne Maury
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/68
- IPC: G03B27/68 ; G03B27/32
Abstract:
According to a first aspect of the invention, there is provided a lithographic method of providing an alignment mark on a layer provided on a substrate, the method including providing the alignment mark on an area of the layer which is oriented within a certain range of angles with respect to a surface of the substrate on which the layer is provided.
Public/Granted literature
- US20090237635A1 LITHOGRAPHIC APPARATUS AND METHOD Public/Granted day:2009-09-24
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