Invention Grant
US08576376B2 Imaging optical system and projection exposure system for microlithography
有权
用于微光刻的成像光学系统和投影曝光系统
- Patent Title: Imaging optical system and projection exposure system for microlithography
- Patent Title (中): 用于微光刻的成像光学系统和投影曝光系统
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Application No.: US12767521Application Date: 2010-04-26
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Publication No.: US08576376B2Publication Date: 2013-11-05
- Inventor: Hans-Juergen Mann
- Applicant: Hans-Juergen Mann
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102007051670 20071026
- Main IPC: G03B27/70
- IPC: G03B27/70 ; G03B27/52

Abstract:
An imaging optical system includes a plurality of mirrors that image an object field in an object plane into an image field in an image plane. At least one of the mirrors is obscured, and thus has a opening for imaging light to pass through. The fourth-last mirror in the light path before the image field is not obscured and provides, with an outer edge of the optically effective reflection surface thereof, a central shadowing in a pupil plane of the imaging optical system. The distance between the fourth-last mirror and the last mirror along the optical axis is at least 10% of the distance between the object field and the image field. An intermediate image, which is closest to the image plane, is arranged between the last mirror and the image plane. The imaging optical system can have a numerical aperture of 0.9. These measures, not all of which must be effected simultaneously, lead to an imaging optical system with improved imaging properties and/or reduced production costs.
Public/Granted literature
- US20100231885A1 IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY Public/Granted day:2010-09-16
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