Invention Grant
- Patent Title: Illumination optical system, exposure apparatus, and device manufacturing method
- Patent Title (中): 照明光学系统,曝光装置和装置制造方法
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Application No.: US12239059Application Date: 2008-09-26
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Publication No.: US08576378B2Publication Date: 2013-11-05
- Inventor: Kenichiro Mori
- Applicant: Kenichiro Mori
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Carter, DeLuca, Farrell & Schmidt LLP
- Priority: JP2007-258040 20071001
- Main IPC: G03B27/72
- IPC: G03B27/72 ; G03B27/54

Abstract:
An illumination optical system comprises a first polarization control unit which is located between a light source and a pupil of an illumination optical system, and a second polarization control unit which is located between the first polarization control unit and the pupil, wherein a region on the pupil includes a plurality of partial regions which are classified into a first group including a partial region having a largest area, and a second group including a partial region different from the partial region having the largest area, and the second polarization control unit controls a polarization state in the partial region which belongs to only the second group.
Public/Granted literature
- US20090086185A1 ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD Public/Granted day:2009-04-02
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