Invention Grant
- Patent Title: Non-volatile semiconductor storage device
- Patent Title (中): 非易失性半导体存储器件
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Application No.: US13223891Application Date: 2011-09-01
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Publication No.: US08576623B2Publication Date: 2013-11-05
- Inventor: Hidefumi Nawata
- Applicant: Hidefumi Nawata
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2011-055291 20110314
- Main IPC: G11C16/04
- IPC: G11C16/04 ; G11C16/34

Abstract:
A non-volatile semiconductor storage device according to one embodiment includes a memory cell array that has NAND cell units in which a plurality of memory cells are connected in series, the control gate of each of the plurality of memory cells being connected to a word line, and a control circuit configured to execute a write operation by applying a write voltage to the word line. The control circuit is configured to execute a correction write operation accompanied by the write operation and executed on a selected memory cell, when a threshold voltage of data written in a reference memory cell is an erase level, the reference memory cell being the memory cell adjacent to the selected memory cell and in which the data is written after the write operation on the selected memory cell.
Public/Granted literature
- US20120236637A1 NON-VOLATILE SEMICONDUCTOR STORAGE DEVICE Public/Granted day:2012-09-20
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