Invention Grant
- Patent Title: Non-volatile memory device having phase-change material and method for fabricating the same
- Patent Title (中): 具有相变材料的非易失性存储器件及其制造方法
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Application No.: US13414014Application Date: 2012-03-07
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Publication No.: US08576654B2Publication Date: 2013-11-05
- Inventor: Yong-shik Shin , Ji-won Jung
- Applicant: Yong-shik Shin , Ji-won Jung
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel Sibley & Sajovec, P.A.
- Priority: KR10-2011-0057001 20110613
- Main IPC: G11C17/18
- IPC: G11C17/18

Abstract:
A non-volatile memory device includes a plurality of memory blocks. Each of memory blocks includes a main area including a plurality of first memory cells having a phase-change material and a spare area including at least one second memory cell for storing initial information about the plurality of first memory cells. In the non-volatile memory device, a circuit of the at least one second memory cell is cut off according to the initial information, and the initial information is defective block information that is information about a defect of the plurality of memory blocks.
Public/Granted literature
- US20120314492A1 NON-VOLATILE MEMORY DEVICE HAVING PHASE-CHANGE MATERIAL AND METHOD FOR FABRICATING THE SAME Public/Granted day:2012-12-13
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