Invention Grant
US08578313B2 Pattern-clip-based hotspot database system for layout verification
有权
基于模式片段的热点数据库系统进行布局验证
- Patent Title: Pattern-clip-based hotspot database system for layout verification
- Patent Title (中): 基于模式片段的热点数据库系统进行布局验证
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Application No.: US12109118Application Date: 2008-04-24
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Publication No.: US08578313B2Publication Date: 2013-11-05
- Inventor: Zongwu Tang , Daniel Zhang , Alex Miloslavsky , Subarnarekha Sinha , Jingyu Xu , Kent Y. Kwang , Kevin A. Beaudette
- Applicant: Zongwu Tang , Daniel Zhang , Alex Miloslavsky , Subarnarekha Sinha , Jingyu Xu , Kent Y. Kwang , Kevin A. Beaudette
- Applicant Address: US CA Mountain View
- Assignee: Synopsys, Inc.
- Current Assignee: Synopsys, Inc.
- Current Assignee Address: US CA Mountain View
- Agency: Park, Vaughan, Fleming & Dowler LLP
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
One embodiment of the present invention provides a system that generates a pattern-clip-based hotspot database for performing automatic pattern-clip-based layout verification. During operation, the system receives a list of pattern clips which specify manufacturing hotspots to be avoided in a layout, wherein each pattern clip comprises a set of geometries in proximity to each other. Next, for each pattern clip, the system perturbs the pattern clip to determine a first range of variations for the constituent set of geometries wherein the perturbed pattern clip no longer causes a manufacturing hotspot. The system then extracts a set of correction guidance descriptions from the first range of variations for correcting the pattern clip. Subsequently, the system stores the pattern clip and the set of correction guidance descriptions in the pattern-clip-based hotspot database.
Public/Granted literature
- US20090271749A1 PATTERN-CLIP-BASED HOTSPOT DATABASE SYSTEM FOR LAYOUT VERIFICATION Public/Granted day:2009-10-29
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