Invention Grant
- Patent Title: Optical integrator system, illumination optical apparatus, exposure apparatus, and device manufacturing method
- Patent Title (中): 光学积分器系统,照明光学装置,曝光装置和装置制造方法
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Application No.: US12068818Application Date: 2008-02-12
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Publication No.: US08587764B2Publication Date: 2013-11-19
- Inventor: Naonori Kita
- Applicant: Naonori Kita
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03B27/72 ; G03B27/42 ; G03B27/52

Abstract:
An optical integrator system comprises a first optical integrator including a plurality of first wavefront dividing elements two-dimensionally juxtaposed, and a second optical integrator including a plurality of second wavefront dividing elements two-dimensionally juxtaposed. Each of the first wavefront dividing elements is so constructed that rays obliquely incident to a center on an optical axis of an entrance surface are emitted in parallel with the optical axis. Each of the second wavefront dividing elements is also so constructed that rays obliquely incident to a center on an optical axis of an entrance surface are emitted in parallel with the optical axis. The system satisfies the condition of P2/(2×tan θ)
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