Invention Grant
US08587769B2 Stage apparatus and lithographic apparatus comprising such stage apparatus
失效
舞台装置和包括这种舞台装置的光刻设备
- Patent Title: Stage apparatus and lithographic apparatus comprising such stage apparatus
- Patent Title (中): 舞台装置和包括这种舞台装置的光刻设备
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Application No.: US13100740Application Date: 2011-05-04
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Publication No.: US08587769B2Publication Date: 2013-11-19
- Inventor: Johannes Antonius Gerardus Akkermans , Theodorus Petrus Maria Cadee , George Wilhelmus Johannes Clijsen
- Applicant: Johannes Antonius Gerardus Akkermans , Theodorus Petrus Maria Cadee , George Wilhelmus Johannes Clijsen
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03B27/62

Abstract:
A stage apparatus to position an object, the stage apparatus including a table configured to hold the object, a support structure configured to support the table, the table being displaceable relative to the support structure, the support structure including one of a first data clock and a second data clock and the table including the other one of the first data clock and the second data clock; and a circuit configured to synchronize the first and second data clocks, the circuit including a transmitter and receiver, the transmitter configured to wirelessly transmit clock signal data from the first data clock to the second data clock, and a synchronization circuit configured to synchronize the second data clock with the first data clock from the wirelessly transmitted clock signal data received by the receiver.
Public/Granted literature
- US20110299057A1 STAGE APPARATUS AND LITHOGRAPHIC APPARATUS COMPRISING SUCH STAGE APPARATUS Public/Granted day:2011-12-08
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