Invention Grant
- Patent Title: Method of adjustment on manufacturing of a circuit having a resonant element
- Patent Title (中): 具有谐振元件的电路的制造调整方法
-
Application No.: US12896093Application Date: 2010-10-01
-
Publication No.: US08587921B2Publication Date: 2013-11-19
- Inventor: Pierre Bar , Sylvain Joblot , David Petit
- Applicant: Pierre Bar , Sylvain Joblot , David Petit
- Applicant Address: FR Montrouge
- Assignee: STMicroelectronics SA
- Current Assignee: STMicroelectronics SA
- Current Assignee Address: FR Montrouge
- Agency: Seed IP Law Group PLLC
- Priority: FR0956860 20091001
- Main IPC: H01G4/005
- IPC: H01G4/005 ; H01G4/06

Abstract:
A method of adjustment in the manufacture of a capacitance of a capacitor supported by a substrate, the method including the steps of: a) forming a first electrode parallel to the surface of the substrate and covering it with a dielectric layer; b) forming, on a first portion of the dielectric layer, a second electrode; c) measuring the capacitance between the first electrode and the second electrode, and deducing therefrom the capacitance to be added to obtain the desired capacitance; d) thinning down a second portion of the dielectric layer, which is not covered by the second electrode, so that the thickness of this second portion is adapted to the forming of the deduced capacitance; and e) forming a third electrode on the thinned-down portion and connecting it to the second electrode.
Public/Granted literature
- US20110080687A1 METHOD OF ADJUSTMENT ON MANUFACTURING OF A CIRCUIT HAVING A RESONANT ELEMENT Public/Granted day:2011-04-07
Information query