Invention Grant
US08589828B2 Reduce mask overlay error by removing film deposited on blank of mask
有权
通过去除沉积在面罩空白上的薄膜来减少掩模覆盖误差
- Patent Title: Reduce mask overlay error by removing film deposited on blank of mask
- Patent Title (中): 通过去除沉积在面罩空白上的薄膜来减少掩模覆盖误差
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Application No.: US13398923Application Date: 2012-02-17
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Publication No.: US08589828B2Publication Date: 2013-11-19
- Inventor: Hsin-Chang Lee , Chia-Jen Chen , Lee-Chih Yeh , Anthony Yen
- Applicant: Hsin-Chang Lee , Chia-Jen Chen , Lee-Chih Yeh , Anthony Yen
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G06F19/00 ; G21K5/00 ; G03F1/00 ; G03F1/22 ; G03F1/20 ; G03F1/42

Abstract:
A method for reducing layer overlay errors by synchronizing the density of mask material in the frame area across the masks in a set is disclosed. An exemplary method includes creating a mask design database corresponding to a mask and containing a die area with one or more dies and a frame area outside the die area. Fiducial features within the frame area are identified, and from the fiducial features, an idle frame area is identified. A reference mask design, which corresponds to a reference mask configured to be aligned with the mask, is used to determine a reference density for the idle frame area. The idle frame area of the mask design database is modified to correspond to the reference density. The modified mask design database is then available for further use including manufacturing the mask.
Public/Granted literature
- US20130219350A1 REDUCE MASK OVERLAY ERROR BY REMOVING FILM DEPOSITED ON BLANK OF MASK Public/Granted day:2013-08-22
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