Invention Grant
US08590342B2 Method for producing TiO2-SiO2 glass body, method for heat-treating TiO2-SiO2 glass body, TiO2-SiO2 glass body, and optical base for EUVL
有权
TiO2-SiO2玻璃体的制备方法，TiO2-SiO2玻璃体的热处理方法，TiO2-SiO2玻璃体，EUVL光学基
- Patent Title: Method for producing TiO2-SiO2 glass body, method for heat-treating TiO2-SiO2 glass body, TiO2-SiO2 glass body, and optical base for EUVL
- Patent Title (中): TiO2-SiO2玻璃体的制备方法，TiO2-SiO2玻璃体的热处理方法，TiO2-SiO2玻璃体，EUVL光学基
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Application No.: US13295652Application Date: 2011-11-14
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Publication No.: US08590342B2Publication Date: 2013-11-26
- Inventor: Akio Koike , Takahiro Mitsumori , Yasutomi Iwahashi , Tomonori Ogawa
- Applicant: Akio Koike , Takahiro Mitsumori , Yasutomi Iwahashi , Tomonori Ogawa
- Applicant Address: JP Tokyo
- Assignee: Asahi Glass Company, Limited
- Current Assignee: Asahi Glass Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2009-116488 20090513
- Main IPC: C03B25/00
- IPC: C03B25/00 ; C03B19/00
Abstract:
The present invention relates to a process for production of a TiO2—SiO2 glass body, comprising a step of, when an annealing point of a TiO2—SiO2 glass body after transparent vitrification is taken as T1(° C.), holding the glass body after transparent vitrification in a temperature region of from T1−90(° C.) to T1−220(° C.) for 120 hours or more.
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