Invention Grant
US08590548B2 Liquid processing apparatus for substrate, method for generating processing liquid, and computer readable recording medium storing program for generating processing liquid therein
有权
用于基板的液体处理装置，用于产生处理液的方法，以及用于在其中产生处理液体的计算机可读记录介质存储程序
- Patent Title: Liquid processing apparatus for substrate, method for generating processing liquid, and computer readable recording medium storing program for generating processing liquid therein
- Patent Title (中): 用于基板的液体处理装置，用于产生处理液的方法，以及用于在其中产生处理液体的计算机可读记录介质存储程序
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Application No.: US12876590Application Date: 2010-09-07
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Publication No.: US08590548B2Publication Date: 2013-11-26
- Inventor: Kazuyoshi Eshima
- Applicant: Kazuyoshi Eshima
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Abelman, Frayne & Schwab
- Priority: JP2009-210898 20090911; JP2010-159436 20100714
- Main IPC: H01L21/304
- IPC: H01L21/304
Abstract:
Provided is a liquid processing apparatus for a substrate, including a plurality of substrate processing units configured to process the substrate using a processing liquid, a processing liquid generating unit configured to dissolve a gas into a solvent to generate the processing liquid with a predetermined concentration where the processing liquid being supplied to one of the plurality of substrate processing units or being supplied to two or more of the plurality of substrate processing units simultaneously, and a control unit configured to control the plurality of substrate processing units. Also provided are a method for generating the processing liquid and a recording medium storing a program for generating the processing liquid. The liquid processing apparatus generates a processing liquid having a predetermined concentration regardless of the flow rate of the processing liquid used simultaneously.
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Information query
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