Invention Grant
- Patent Title: Compound semiconductor single-crystal manufacturing device and manufacturing method
- Patent Title (中): 复合半导体单晶制造装置及其制造方法
-
Application No.: US12668426Application Date: 2009-03-06
-
Publication No.: US08591653B2Publication Date: 2013-11-26
- Inventor: Issei Satoh , Naho Mizuhara , Keisuke Tanizaki , Michimasa Miyanaga , Takashi Sakurada , Hideaki Nakahata
- Applicant: Issei Satoh , Naho Mizuhara , Keisuke Tanizaki , Michimasa Miyanaga , Takashi Sakurada , Hideaki Nakahata
- Applicant Address: JP Osaka
- Assignee: Sumitomo Electric Industries, Ltd.
- Current Assignee: Sumitomo Electric Industries, Ltd.
- Current Assignee Address: JP Osaka
- Agent James W. Judge
- Priority: JP2008-061444 20080311
- International Application: PCT/JP2009/054281 WO 20090306
- International Announcement: WO2009/113455 WO 20090917
- Main IPC: C30B21/02
- IPC: C30B21/02

Abstract:
A compound semiconductor single-crystal manufacturing device (1) is furnished with: a laser light source (6) making it possible to sublime a source material by directing a laser beam onto the material; a reaction vessel (2) having a laser entry window (5) through which the laser beam output from the laser light source (6) can be transmitted to introduce the beam into the vessel interior, and that is capable of retaining a starting substrate (3) where sublimed source material is recrystallized; and a heater (7) making it possible to heat the starting substrate (3). The laser beam is shone on, to heat and thereby sublime, the source material within the reaction vessel (2), and compound semiconductor single crystal is grown by recrystallizing the sublimed source material onto the starting substrate (3); afterwards the laser beam is employed to separate the compound semiconductor single crystal from the starting substrate (3).
Public/Granted literature
- US20100319614A1 Compound Semiconductor Single-Crystal Manufacturing Device and Manufacturing Method Public/Granted day:2010-12-23
Information query