Invention Grant
- Patent Title: Substrate transfer container, gas purge monitoring tool, and semiconductor manufacturing equipment with the same
- Patent Title (中): 基板转移容器,气体净化监测工具和半导体制造设备相同
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Application No.: US13048153Application Date: 2011-03-15
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Publication No.: US08591809B2Publication Date: 2013-11-26
- Inventor: Byung-Koog Ra , Tae-Sik Yun , Kunhyung Lee , Hyunjoon Kim , Hyeogki Kim , KiDoo Kim
- Applicant: Byung-Koog Ra , Tae-Sik Yun , Kunhyung Lee , Hyunjoon Kim , Hyeogki Kim , KiDoo Kim
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Onello & Mello, LLP
- Priority: KR10-2010-0022928 20100315; KR10-2010-0115102 20101118
- Main IPC: G01N21/00
- IPC: G01N21/00 ; G01N31/00 ; G01N33/00 ; G06F11/30 ; G21C17/00 ; B65B1/30 ; B65B3/26 ; B65B1/04 ; B65B3/04 ; B67C3/02 ; H01L21/20 ; H01L21/36 ; C23C16/24

Abstract:
A substrate transfer container comprises a housing including a plurality of substrate slots positioned within a gas chamber having an interior environment. Each substrate slot accommodates a substrate undergoing a substrate manufacturing process, the interior environment of the gas chamber being selectively sealed from an exterior environment. A detection unit at the housing is constructed and arranged to detect an environmental property of the interior environment of the gas chamber, and to generate a detection signal in response. A signal transmission module at the housing is configured to wirelessly transmit a detection signal received from the detection unit.
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