Invention Grant
US08592129B2 Resin, resist composition and method for producing resist pattern
有权
树脂,抗蚀剂组合物和抗蚀剂图案的制造方法
- Patent Title: Resin, resist composition and method for producing resist pattern
- Patent Title (中): 树脂,抗蚀剂组合物和抗蚀剂图案的制造方法
-
Application No.: US12872817Application Date: 2010-08-31
-
Publication No.: US08592129B2Publication Date: 2013-11-26
- Inventor: Koji Ichikawa , Akira Kamabuchi , Yuichi Mukai
- Applicant: Koji Ichikawa , Akira Kamabuchi , Yuichi Mukai
- Applicant Address: JP Tokyo
- Assignee: Sumitomo Chemical Company, Limited
- Current Assignee: Sumitomo Chemical Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2009-200637 20090831; JP2009-288800 20091221; JP2009-289082 20091221; JP2009-289083 20091221; JP2009-289084 20091221; JP2009-289085 20091221; JP2010-121139 20100527
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C08F26/06

Abstract:
A resin comprises a structural unit derived from a compound represented by the formula (I); wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that optionally has one or more halogen atoms; X1 represents a C2 to C36 heterocyclic group, one or more hydrogen atoms contained in the heterocyclic group may be replaced by a halogen atom, a hydroxy group, a C1 to C24 hydrocarbon group, a C1 to C12 alkoxyl group, a C2 to C4 acyl group, or a C2 to C4 acyloxy group, and one or more —CH2— contained in the heterocyclic group may be replaced by —CO— or —O—.
Public/Granted literature
- US20110053082A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN Public/Granted day:2011-03-03
Information query
IPC分类: