Invention Grant
US08592130B2 Photosensitive resin composition, photosensitive element, method of forming resist pattern and method of producing printed wiring board
失效
光敏树脂组合物,感光元件,抗蚀图案的形成方法和制造印刷电路板的方法
- Patent Title: Photosensitive resin composition, photosensitive element, method of forming resist pattern and method of producing printed wiring board
- Patent Title (中): 光敏树脂组合物,感光元件,抗蚀图案的形成方法和制造印刷电路板的方法
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Application No.: US12995301Application Date: 2009-05-22
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Publication No.: US08592130B2Publication Date: 2013-11-26
- Inventor: Masahiro Miyasaka , Yukiko Muramatsu
- Applicant: Masahiro Miyasaka , Yukiko Muramatsu
- Applicant Address: JP Tokyo
- Assignee: Hitachi Chemical Company, Ltd.
- Current Assignee: Hitachi Chemical Company, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Griffin & Szipl, P.C.
- Priority: JPP2008-143541 20080530
- International Application: PCT/JP2009/059440 WO 20090522
- International Announcement: WO2009/145120 WO 20091203
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/004 ; G03F7/028 ; G03F7/11 ; G03F7/40

Abstract:
A photosensitive resin composition comprising: (A) a binder polymer having a divalent group represented by formula (I), (II) and (III); (B) a photopolymerizing compound; and (C) a photopolymerization initiator. [In formulas (I), (II) and (III), R1, R2, R4 each independently represents a hydrogen atom or a methyl group, R3 is C1-C3 alkyl group, etc., m is an integer of 0-5, R5, R6 and R7 each independently represents a hydrogen atom or a C1-C5 alkyl group, and at least two among R5, R6 and R7 are C1-C5 alkyl groups.]
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