Invention Grant
- Patent Title: Silicon-containing alicyclic polyimide resin, polyamic acid resin, and manufacturing method for same
- Patent Title (中): 含硅脂环族聚酰亚胺树脂,聚酰胺酸树脂及其制造方法
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Application No.: US13583727Application Date: 2011-04-13
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Publication No.: US08592546B2Publication Date: 2013-11-26
- Inventor: Tooru Kikuchi , Toshihiko Takasaki , Katsuyuki Masuda
- Applicant: Tooru Kikuchi , Toshihiko Takasaki , Katsuyuki Masuda
- Applicant Address: JP Tokyo
- Assignee: Hitachi Chemical Company, Ltd.
- Current Assignee: Hitachi Chemical Company, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2010-179059 20100809
- International Application: PCT/JP2011/059209 WO 20110413
- International Announcement: WO2012/020584 WO 20120216
- Main IPC: C08G77/452
- IPC: C08G77/452

Abstract:
A polyimide resin including repeating units represented by formula (1): wherein R is a diamine residue or a diisocyanate residue; m is an integer of 2 to 30; any of silicon atoms bonded to norbornane rings is in exo configuration with respect to the norbornane rings; and any of imide rings bonded to the norbornane rings is in exo configuration with respect to the norbornane rings, and a polyamic acid resin including repeating units represented by formula (2): wherein R is a diamine residue; m is an integer of 2 to 30; any of silicon atoms bonded to norbornane rings is in exo configuration with respect to the norbornane rings; and any of amide groups and carboxyl groups bonded to the norbornane rings is in exo configuration with respect to the norbornane rings. The polyimide resin is soluble in general-purpose solvents, has a good transparency and a high molecular weight, and is excellent in mechanical properties, such as tensile strength and elongation.
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