Invention Grant
US08592869B2 Nitride-based heterojunction semiconductor device and method for the same 有权
氮化物基异质结半导体器件及其方法

Nitride-based heterojunction semiconductor device and method for the same
Abstract:
Disclosed is a semiconductor device. More specifically, disclosed are a nitride-based heterojunction semiconductor device and a method for producing the same. The nitride-based heterojunction semiconductor device includes a nitride semiconductor buffer layer, a barrier layer disposed on the buffer layer, a cap layer discontinuously disposed on the barrier layer, a source electrode and a drain electrode that contact at least one of the barrier layer and the cap layer, and a gate electrode that Schottky-contacts at least one of the barrier layer and the cap layer and is disposed between the source electrode and the drain electrode.
Information query
Patent Agency Ranking
0/0