Invention Grant
- Patent Title: Nitride-based heterojunction semiconductor device and method for the same
- Patent Title (中): 氮化物基异质结半导体器件及其方法
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Application No.: US13554455Application Date: 2012-07-20
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Publication No.: US08592869B2Publication Date: 2013-11-26
- Inventor: Jinhong Park , Kwangchoong Kim , Taehoon Jang
- Applicant: Jinhong Park , Kwangchoong Kim , Taehoon Jang
- Applicant Address: KR Seoul
- Assignee: LG Electronics Inc.
- Current Assignee: LG Electronics Inc.
- Current Assignee Address: KR Seoul
- Agency: McKenna Long & Aldridge, LLP
- Priority: KR10-2011-0073586 20110725
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L21/338

Abstract:
Disclosed is a semiconductor device. More specifically, disclosed are a nitride-based heterojunction semiconductor device and a method for producing the same. The nitride-based heterojunction semiconductor device includes a nitride semiconductor buffer layer, a barrier layer disposed on the buffer layer, a cap layer discontinuously disposed on the barrier layer, a source electrode and a drain electrode that contact at least one of the barrier layer and the cap layer, and a gate electrode that Schottky-contacts at least one of the barrier layer and the cap layer and is disposed between the source electrode and the drain electrode.
Public/Granted literature
- US20130026450A1 NITRIDE-BASED HETEROJUCTION SEMICONDUCTOR DEVICE AND METHOD FOR THE SAME Public/Granted day:2013-01-31
Information query
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