Invention Grant
- Patent Title: Drain extended CMOS with counter-doped drain extension
- Patent Title (中): 漏极扩展扩展CMOS
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Application No.: US13288690Application Date: 2011-11-03
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Publication No.: US08592900B2Publication Date: 2013-11-26
- Inventor: Philipp Steinmann , Amitava Chatterjee , Sameer Pendharkar
- Applicant: Philipp Steinmann , Amitava Chatterjee , Sameer Pendharkar
- Applicant Address: US TX Dallas
- Assignee: Texas Instruments Incorporated
- Current Assignee: Texas Instruments Incorporated
- Current Assignee Address: US TX Dallas
- Agent W. James Brady, III; Frederick J. Telecky, Jr.
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
An integrated circuit containing a diode with a drift region containing a first dopant type plus scattering centers. An integrated circuit containing a DEMOS transistor with a drift region containing a first dopant type plus scattering centers. A method for designing an integrated circuit containing a DEMOS transistor with a counter doped drift region.
Public/Granted literature
- US20120112275A1 Drain Extended CMOS with Counter-Doped Drain Extension Public/Granted day:2012-05-10
Information query
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