Invention Grant
- Patent Title: Bipolar semiconductor device and manufacturing method
- Patent Title (中): 双极半导体器件及制造方法
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Application No.: US12324374Application Date: 2008-11-26
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Publication No.: US08592903B2Publication Date: 2013-11-26
- Inventor: Hans-Joachim Schulze , Frank Pfirsch
- Applicant: Hans-Joachim Schulze , Frank Pfirsch
- Applicant Address: AT Villach
- Assignee: Infineon Technologies Austria AG
- Current Assignee: Infineon Technologies Austria AG
- Current Assignee Address: AT Villach
- Agency: Dicke, Billig & Czaja, PLLC
- Main IPC: H01L29/78
- IPC: H01L29/78

Abstract:
A bipolar semiconductor device and manufacturing method. One embodiment provides a diode structure including a structured emitter coupled to a first metallization is provided. The structured emitter includes a first weakly doped semiconductor region of a first conductivity type which forms a pn-load junction with a weakly doped second semiconductor region of the diode structure. The structured emitter includes at least a highly doped first semiconductor island of the first conductivity type which at least partially surrounds a highly doped second semiconductor island of the second conductivity type.
Public/Granted literature
- US20100127304A1 BIPOLAR SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD Public/Granted day:2010-05-27
Information query
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