Invention Grant
- Patent Title: Photoelectric conversion device, fabrication method for the same, and solid state imaging device
- Patent Title (中): 光电转换装置及其制造方法以及固态成像装置
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Application No.: US12937013Application Date: 2009-03-30
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Publication No.: US08592933B2Publication Date: 2013-11-26
- Inventor: Kenichi Miyazaki , Osamu Matsushima , Shigeru Niki , Keiichiro Sakurai , Shogo Ishizuka
- Applicant: Kenichi Miyazaki , Osamu Matsushima , Shigeru Niki , Keiichiro Sakurai , Shogo Ishizuka
- Applicant Address: JP Kyoto JP Tokyo
- Assignee: Rohm Co., Ltd.,National Institute of Advanced Industrial Science and Technology
- Current Assignee: Rohm Co., Ltd.,National Institute of Advanced Industrial Science and Technology
- Current Assignee Address: JP Kyoto JP Tokyo
- Agency: Fish & Richardson P.C.
- Priority: JPP2008-104052 20081104
- International Application: PCT/JP2009/056523 WO 20090330
- International Announcement: WO2009/125688 WO 20091015
- Main IPC: H01L31/00
- IPC: H01L31/00

Abstract:
A photoelectric conversion device has a high S/N ratio and can increase the detection efficiency even under a low luminance. The photoelectric conversion device generates an increased electric charge by impact ionization in a photoelectric conversion unit formed from a chalcopyrite type semiconductor, so as to improve dark current characteristic. The photoelectric conversion device includes: a lower electrode layer; a compound semiconductor thin film of chalcopyrite structure disposed on the lower electrode layer and having a high resistivity layer on a surface; and a transparent electrode layer disposed on the compound semiconductor thin film , wherein the lower electrode layer, the compound semiconductor thin film, and the transparent electrode layer are laminated one after another, and a reverse bias voltage is applied between the transparent electrode layer and the lower electrode layer, and the multiplication by the impact ionization of the electric charge generated by photoelectric conversion is generated within the compound semiconductor thin film. It is also possible to provide a fabrication method for such photoelectric conversion device, and a solid state imaging device using the photoelectric conversion device.
Public/Granted literature
- US20110024859A1 PHOTOELECTRIC CONVERSION DEVICE, FABRICATION METHOD FOR THE SAME, AND SOLID STATE IMAGING DEVICE Public/Granted day:2011-02-03
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