Invention Grant
- Patent Title: Stage control device, stage control method and microscope
- Patent Title (中): 舞台控制装置,舞台控制方法和显微镜
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Application No.: US13075672Application Date: 2011-03-30
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Publication No.: US08593730B2Publication Date: 2013-11-26
- Inventor: Takashi Yamamoto , Yu Hirono , Fumiyasu Suzuki
- Applicant: Takashi Yamamoto , Yu Hirono , Fumiyasu Suzuki
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: K&L Gates LLP
- Priority: JPP2010-088939 20100407
- Main IPC: G02B21/26
- IPC: G02B21/26

Abstract:
A stage control device including a position detection portion which detects a position deviation of a support plate relative to a reference position regulated by a convex portion provided in a stage, from an image of a scope including the support plate on which a sample is disposed and which is mounted on the stage; and a stage control portion that presses the stage, which is moved and controlled in a surface direction of the support plate so that the sample is in an imaging scope of an imaging element, from a position of a detection point in time in a direction corresponding to a position deviation at a pressing speed, and returns the stage up to a position of the detection point in time at a return speed slower than the pressing speed, when the position deviation of the support plate relative to the reference position is detected.
Public/Granted literature
- US20110249327A1 STAGE CONTROL DEVICE, STAGE CONTROL METHOD AND MICROSCOPE Public/Granted day:2011-10-13
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