Invention Grant
US08594145B2 Group-III nitride semiconductor laser device, and method for fabricating group-III nitride semiconductor laser device
有权
III族氮化物半导体激光器件以及III族氮化物半导体激光器件的制造方法
- Patent Title: Group-III nitride semiconductor laser device, and method for fabricating group-III nitride semiconductor laser device
- Patent Title (中): III族氮化物半导体激光器件以及III族氮化物半导体激光器件的制造方法
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Application No.: US12837291Application Date: 2010-07-15
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Publication No.: US08594145B2Publication Date: 2013-11-26
- Inventor: Shimpei Takagi , Yusuke Yoshizumi , Koji Katayama , Masaki Ueno , Takatoshi Ikegami
- Applicant: Shimpei Takagi , Yusuke Yoshizumi , Koji Katayama , Masaki Ueno , Takatoshi Ikegami
- Applicant Address: JP Osaka-shi
- Assignee: Sumitomo Electric Industries, Ltd.
- Current Assignee: Sumitomo Electric Industries, Ltd.
- Current Assignee Address: JP Osaka-shi
- Agency: Venable LLP
- Agent Michael A. Sartori; Tamatane J. Aga
- Priority: JP2010-131404 20100608
- Main IPC: H01S5/00
- IPC: H01S5/00

Abstract:
A III-nitride semiconductor laser device includes a laser structure including a support base, a semiconductor region, and an electrode. The support base includes a hexagonal III-nitride semiconductor and a semipolar primary surface. The semiconductor region includes first and second cladding layers and an active layer arranged along an axis normal to the semipolar primary surface. A c-axis of the hexagonal III-nitride semiconductor is inclined at an angle ALPHA with respect to the normal axis toward an m-axis of the hexagonal III-nitride semiconductor. The laser structure includes first and second fractured faces that intersect with an m-n plane defined by the normal axis and the m-axis of the hexagonal III-nitride semiconductor. A laser cavity of the laser device includes the first and second fractured faces. Each of the first and second fractured faces have a stripe structure on an end face of the support base.
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