A sewing machine that includes a first reference setting portion setting, as a first reference, a reference for a first pattern sewn in a first holding position, a first layout identification portion identifying, as a first marker layout, a marker for the first reference, a first reference change portion changing the first reference after the first marker layout is identified, a second layout identification portion identifying, as a second marker layout, a marker for the changed first reference, a second reference setting portion setting, as a second reference, a reference for a second pattern sewn in a second holding position, a third layout identification portion identifying, as a third marker layout, a marker for the first reference in the second holding position or the changed first reference, and a setting portion setting the second pattern for the sewing target object in the second holding position.