Invention Grant
- Patent Title: Synthetic silica glass with uniform fictive temperature
- Patent Title (中): 具有均匀假想温度的合成石英玻璃
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Application No.: US12902238Application Date: 2010-10-12
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Publication No.: US08596094B2Publication Date: 2013-12-03
- Inventor: Carlos Duran , Kenneth Edward Hrdina , Ulrich Wilhelm Heinz Neukirch
- Applicant: Carlos Duran , Kenneth Edward Hrdina , Ulrich Wilhelm Heinz Neukirch
- Applicant Address: US NY Corning
- Assignee: Corning Incorporated
- Current Assignee: Corning Incorporated
- Current Assignee Address: US NY Corning
- Agent Robert P. Santandrea
- Main IPC: C03B13/00
- IPC: C03B13/00 ; C03B15/00 ; C03B19/00 ; C03B25/00 ; C03C3/06

Abstract:
A method of making a silica glass having a uniform fictive temperature. The glass article is heated at a target fictive temperature, or heated or cooled at a rate that is less than the rate of change of the fictive temperature, for a time that is sufficient to allow the fictive temperature of the glass to come within 3° C. of the target fictive temperature. The silica glass is then cooled from the target fictive temperature to a temperature below the strain point of the glass at a cooling rate that is greater than the relaxation rate of the glass at the target fictive temperature. The silica glass has a fictive temperature that varies by less than 3° C. after the annealing step. A silica glass made by the method is also described.
Public/Granted literature
- US20110092354A1 SYNTHETIC SILICA GLASS WITH UNIFORM FICTIVE TEMPERATURE Public/Granted day:2011-04-21
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