Invention Grant
- Patent Title: Exhausting method and gas processing apparatus
- Patent Title (中): 排气方式和气体处理装置
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Application No.: US13205077Application Date: 2011-08-08
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Publication No.: US08597401B2Publication Date: 2013-12-03
- Inventor: Norihiko Amikura , Risako Miyoshi
- Applicant: Norihiko Amikura , Risako Miyoshi
- Applicant Address: JP
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP
- Agency: Cantor Colburn LLP
- Priority: JP2010-178688 20100809
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
An exhausting method includes determining an exhaust flow rate of a process gas to be a predetermined value that is less than or equal to a gas flow rate corresponding to a maximum process capability of a purification system when the process gas is diluted to a lower explosive limit; calculating a pressure drop amount per unit time to maintain the determined exhaust flow rate of the process gas, based on a relation between the exhaust flow rate and the pressure drop amount per unit time; and evacuating an inside of the chamber to maintain the determined exhaust flow rate, while controlling the pressure through an automatic pressure control valve by setting a target pressure value to be updated as a control value of the automatic pressure control valve at every predetermined time interval so as to achieve a calculated pressure drop amount per unit time.
Public/Granted literature
- US20120031266A1 EXHAUSTING METHOD AND GAS PROCESSING APPARATUS Public/Granted day:2012-02-09
Information query
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