Invention Grant
- Patent Title: Gas purifying process and device
- Patent Title (中): 气体净化工艺及装置
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Application No.: US12801052Application Date: 2010-05-19
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Publication No.: US08597584B2Publication Date: 2013-12-03
- Inventor: Tadahiro Ohmi , Ryuichi Yazaki , Masato Kawai , Tetsuya Kimijima , Kunio Matsuda
- Applicant: Tadahiro Ohmi , Ryuichi Yazaki , Masato Kawai , Tetsuya Kimijima , Kunio Matsuda
- Applicant Address: JP Tokyo JP Sendai-shi, Miyagi-ken
- Assignee: Taiyo Nippon Sanso Corporation,Tadahiro Ohmi
- Current Assignee: Taiyo Nippon Sanso Corporation,Tadahiro Ohmi
- Current Assignee Address: JP Tokyo JP Sendai-shi, Miyagi-ken
- Agency: Nixon & Vanderhye P.C.
- Priority: JP2002-150522 20020524
- Main IPC: B01D53/46
- IPC: B01D53/46 ; B01D53/60

Abstract:
This gas purifying process removes trace constituents from a mixed gas that includes a rare gas and nitrogen as main components, and at least one from among hydrogen, nitrogen and hydrogen reaction products, and water vapor as the trace constituent. This process sequentially carries out an adsorbing step for removing water vapor and nitrogen and hydrogen reaction products; a hydrogen oxidation step for converting the hydrogen into water vapor by means of a hydrogen oxidation catalytic reaction in the presence of oxygen; and a drying step for removing water vapor generated in the hydrogen oxidation step. When nitrogen oxides are included as a trace constituent, then a denitration step is carried out prior to the adsorbing step, to convert nitrogen oxides into nitrogen and water vapor by means of a catalytic denitration reaction in the presence of a reducing substance.
Public/Granted literature
- US20100247395A1 Gas purifying process and device Public/Granted day:2010-09-30
Information query
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