Invention Grant
US08597776B2 Ceramic material, laminate, member for use in semiconductor manufacturing equipment, and sputtering target member 有权
陶瓷材料,层压板,用于半导体制造设备的构件和溅射靶构件

Ceramic material, laminate, member for use in semiconductor manufacturing equipment, and sputtering target member
Abstract:
A ceramic material mainly contains magnesium, aluminum, oxygen, and nitrogen, in which the ceramic material has a magnesium-aluminum oxynitride phase serving as a main phase, wherein XRD peaks of the magnesium-aluminum oxynitride phase measured with CuKα radiation appear at at least 2θ=47 to 50°.
Information query
Patent Agency Ranking
0/0