Invention Grant
- Patent Title: Three-dimensional direct-write lithography
- Patent Title (中): 三维直写光刻技术
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Application No.: US11993015Application Date: 2006-06-16
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Publication No.: US08597871B2Publication Date: 2013-12-03
- Inventor: Robert R. McLeod
- Applicant: Robert R. McLeod
- Applicant Address: US CO Denver
- Assignee: The Regents of the University of Colorado
- Current Assignee: The Regents of the University of Colorado
- Current Assignee Address: US CO Denver
- Agency: Perkins Coie LLP
- International Application: PCT/US2006/023520 WO 20060616
- International Announcement: WO2006/138587 WO 20061228
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G02B6/12 ; G02B21/18
Abstract:
A method of creating a region of index change in a photopolymer includes providing a photopolymer having a photosensitivity to light of a particular wavelength and creating a region of index change in the photopolymer by applying direct write lithography to expose the photopolymer of the region to light that includes the particular wavelength.
Public/Granted literature
- US20090218519A1 Three-Dimensional Direct-Write Lithography Public/Granted day:2009-09-03
Information query
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