Invention Grant
US08597967B1 Method and system for dicing substrates containing gallium and nitrogen material
有权
用于切割含有镓和氮材料的基材的方法和系统
- Patent Title: Method and system for dicing substrates containing gallium and nitrogen material
- Patent Title (中): 用于切割含有镓和氮材料的基材的方法和系统
-
Application No.: US13298617Application Date: 2011-11-17
-
Publication No.: US08597967B1Publication Date: 2013-12-03
- Inventor: Michael R. Krames , Tai Margalith , Rafael Aldaz
- Applicant: Michael R. Krames , Tai Margalith , Rafael Aldaz
- Applicant Address: US CA Fremont
- Assignee: Soraa, Inc.
- Current Assignee: Soraa, Inc.
- Current Assignee Address: US CA Fremont
- Agency: Kilpatrick Townsend & Stockton LLP
- Main IPC: H01L21/18
- IPC: H01L21/18 ; H01L33/02 ; H01L33/20

Abstract:
The present disclosure relates generally to semiconductor techniques. More specifically, embodiments of the present disclosure provide methods for efficiently dicing substrates containing gallium and nitrogen material. Additionally the present disclosure provide techniques resulting in a optical device comprising a substrate having three or more corners, where at least one of the corners is defined by a dislocation bundle characterized by a diameter of less than 100 microns, the gallium and nitrogen containing substrate having a predefined portion free from dislocation bundle centers, an active region containing one or more active layers, the active region being positioned within the predefined region; and a conductive region formed within the predefined region.
Information query
IPC分类: