Invention Grant
- Patent Title: Microelectronic devices and methods for manufacturing microelectronic devices
- Patent Title (中): 用于制造微电子器件的微电子器件和方法
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Application No.: US12981892Application Date: 2010-12-30
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Publication No.: US08597981B2Publication Date: 2013-12-03
- Inventor: Rick C. Lake
- Applicant: Rick C. Lake
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Perkins Coie LLP
- Main IPC: H01L21/50
- IPC: H01L21/50

Abstract:
Microelectronic devices and methods for manufacturing microelectronic devices are disclosed herein. In one embodiment, a microelectronic device includes a microelectronic die, a plurality of electrical couplers projecting from the die, and a flowable material disposed on the die. The die includes an integrated circuit and a plurality of terminals operably coupled to the integrated circuit. The electrical couplers are attached to corresponding terminals on the die. The flowable material includes a plurality of spacer elements sized to space the die apart from another component. The flowable material may be a no-flow underfill, a flux compound, or other suitable material.
Public/Granted literature
- US20110097847A1 MICROELECTRONIC DEVICES AND METHODS FOR MANUFACTURING MICROELECTRONIC DEVICES Public/Granted day:2011-04-28
Information query
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