Invention Grant
- Patent Title: Semiconductor device and method of fabrication
- Patent Title (中): 半导体器件及其制造方法
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Application No.: US13113901Application Date: 2011-05-23
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Publication No.: US08597994B2Publication Date: 2013-12-03
- Inventor: Randy W. Mann
- Applicant: Randy W. Mann
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES, Inc.
- Current Assignee: GLOBALFOUNDRIES, Inc.
- Current Assignee Address: KY Grand Cayman
- Agency: Ingrassia Fisher & Lorenz, P.C.
- Main IPC: H01L21/8238
- IPC: H01L21/8238

Abstract:
A semiconductor device is provided that includes a first inverter having a first p-channel FinFET and a first n-channel FinFET each coupled to a first shared contact forming a first cell node and having a first common gate. A second inverter is included having a second p-channel FinFET and a second n-channel FINFET each coupled to a second shared contact forming a second cell node and having a second common gate aligned with the first shared contact of the first inverter forming a latch circuit. Additionally, a pair of FinFET passgates are included each having a drain contact respectively coupled the first and second cell nodes and a source contact connected to one of a complementary bit line. Finally, a word line is connected to a gate contact of each of the pair of FinFET passgates to provide a static random access memory cell.
Public/Granted literature
- US20120299106A1 SEMICONDUCTOR DEVICE AND METHOD OF FABRICATION Public/Granted day:2012-11-29
Information query
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