Invention Grant
- Patent Title: Projection system with compensation of intensity variations and compensation element therefor
- Patent Title (中): 具有强度变化补偿和补偿要素的投影系统
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Application No.: US11628356Application Date: 2005-06-03
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Publication No.: US08605257B2Publication Date: 2013-12-10
- Inventor: Patrick Scheible , Alexandra Pazidis , Reiner Garreis , Michael Totzeck , Heiko Feldmann , Paul Graeupner , Hans-Juergen Rostalski , Wolfgang Singer
- Applicant: Alexandra Pazidis , Reiner Garreis , Michael Totzeck , Heiko Feldmann , Paul Graeupner , Hans-Juergen Rostalski , Wolfgang Singer , Guenter Scheible , Sigrid Scheible
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Sughrue Mion, PLLC
- International Application: PCT/EP2005/005979 WO 20050603
- International Announcement: WO2005/119369 WO 20051215
- Main IPC: G03B27/72
- IPC: G03B27/72 ; G03B27/68

Abstract:
In a projection objective for imaging a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, at least one optical component is provided which has a substrate in which at least one substrate surface is covered with an interference layer system having a great spatial modulation of the reflectance and/or of the transmittance over a usable cross section of the optical component, the modulation being adapted to a spatial transmission distribution of the remaining components of the projection objective in such a way that an intensity distribution of the radiation that is measured in a pupil surface has a substantially reduced spatial modulation in comparison with a projection objective without the interference layer system.
Public/Granted literature
- US20080094599A1 Projection System with Compensation of Intensity Variations and Compensation Element Therefor Public/Granted day:2008-04-24
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