Invention Grant
US08605264B2 Apparatus and method for quantifying residual stress of a birefringent material
有权
用于量化双折射材料的残余应力的装置和方法
- Patent Title: Apparatus and method for quantifying residual stress of a birefringent material
- Patent Title (中): 用于量化双折射材料的残余应力的装置和方法
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Application No.: US13158434Application Date: 2011-06-12
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Publication No.: US08605264B2Publication Date: 2013-12-10
- Inventor: Wei-Chung Wang , Chi-Hung Huang , Yu-Cheng Tseng , Po-Chi Sung
- Applicant: Wei-Chung Wang , Chi-Hung Huang , Yu-Cheng Tseng , Po-Chi Sung
- Applicant Address: TW Hsinchu
- Assignee: National Tsing Hua University
- Current Assignee: National Tsing Hua University
- Current Assignee Address: TW Hsinchu
- Agency: Ditthavong Mori & Steiner, P.C.
- Priority: TW100101090A 20110112
- Main IPC: G01B11/16
- IPC: G01B11/16

Abstract:
An apparatus for quantifying residual stress of a birefringent material comprises a light source generating light; a vertical polarizer converting a beam of light into a beam with vertical polarization; a standard material being mounted in front of the vertical polarizer; a horizontal polarizer converting a beam of light into a beam with horizontal polarization; an applied force unit applying different forces to the standard material; a spectrometer being mounted in front of the horizontal polarizer and recording intensity of light passing through the horizontal polarizer and transmittance of the standard material and a processing module being connected to the spectrometer, deriving a stress formula from the applied forces and transmittances of the standard material and obtaining a stress distribution of the birefringent material. A method for quantifying residual stress of a birefringent material is also disclosed.
Public/Granted literature
- US20120176598A1 APPARATUS AND METHOD FOR QUANTIFYING RESIDUAL STRESS OF A BIREFRINGENT MATERIAL Public/Granted day:2012-07-12
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