Invention Grant
- Patent Title: Method of making in an integrated circuit including simplifying metal shapes
- Patent Title (中): 包括简化金属形状的集成电路制造方法
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Application No.: US13010394Application Date: 2011-01-20
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Publication No.: US08607183B2Publication Date: 2013-12-10
- Inventor: Hanno Melzner , Olivier Rizzo , Jacques Herry
- Applicant: Hanno Melzner , Olivier Rizzo , Jacques Herry
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Dicke, Billig & Czaja, PLLC
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
A method for simplifying metal shapes in an integrated circuit including receiving an incoming wire layout for at least one metal layer of an integrated circuit, the incoming wire layout for the at least one layer including a plurality of wires running in a preferred direction and a plurality of vias connected thereto. The method further includes segmenting each of the wires into a plurality of bricks according to a set of equally spaced parallel grid lines extending in direction which is perpendicular to the preferred direction such that each wire comprises a series of consecutive bricks with brick boundaries between consecutive bricks occurring at a grid line, defining each brick as a regular or complex brick based on at least one brick criteria, and defining brick groups based on one or more grouping criteria, wherein each group contains one or more consecutive bricks of a same wire and each brick belongs to only one group so that each wire comprises a series of one or more consecutive groups, and wherein groups containing at least one complex brick are defined as complex groups.
Public/Granted literature
- US20110113400A1 METHOD OF MAKING IN AN INTEGRATED CIRCUIT INCLUDING SIMPLIFYING METAL SHAPES Public/Granted day:2011-05-12
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