Invention Grant
- Patent Title: Apparatus and method for producing free-standing materials
- Patent Title (中): 用于生产独立材料的装置和方法
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Application No.: US13449126Application Date: 2012-04-17
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Publication No.: US08613899B2Publication Date: 2013-12-24
- Inventor: Heather A. G. Stern , Vincent DiFilippo , Jitendra S. Goela , Michael A. Pickering , Hua Bai , Debashis Chakraborty , Hangyao Wang
- Applicant: Heather A. G. Stern , Vincent DiFilippo , Jitendra S. Goela , Michael A. Pickering , Hua Bai , Debashis Chakraborty , Hangyao Wang
- Applicant Address: US MA Marlborough US MI Midland
- Assignee: Rohm and Haas Electronic Materials LLC,Dow Global Technologies LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC,Dow Global Technologies LLC
- Current Assignee Address: US MA Marlborough US MI Midland
- Agent John J. Piskorski
- Main IPC: B01J19/00
- IPC: B01J19/00 ; C01B17/00 ; C01B19/00 ; H01L21/00

Abstract:
An apparatus includes a manifold with a chamber for mixing multiple reactants. Gases are jetted into the manifold by a plurality of inlet injectors. The inlet injectors are arranged such that the gases passing into the manifold impinge on each other at a common point to form a mixture. The mixture passes through a plurality of holes in one side of the manifold into a deposition chamber where the mixture of gases impinges on additional gases at a common point to provide a reaction resulting in deposition of solid materials in the deposition chamber. The solid materials are free-standing.
Public/Granted literature
- US20130270356A1 APPARATUS AND METHOD FOR PRODUCING FREE-STANDING MATERIALS Public/Granted day:2013-10-17
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