Invention Grant
US08614783B2 Encoder-type measurement system, lithographic apparatus and method to detect an error on or in a grid or grating of an encoder-type measurement system
有权
编码器型测量系统，光刻设备和方法，用于检测编码器型测量系统的栅格或光栅上或之上的误差
- Patent Title: Encoder-type measurement system, lithographic apparatus and method to detect an error on or in a grid or grating of an encoder-type measurement system
- Patent Title (中): 编码器型测量系统，光刻设备和方法，用于检测编码器型测量系统的栅格或光栅上或之上的误差
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Application No.: US12392852Application Date: 2009-02-25
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Publication No.: US08614783B2Publication Date: 2013-12-24
- Inventor: Emiel Jozef Melanie Eussen , Engelbertus Antonius Fransiscus Van Der Pasch , Robbert Edgar Van Leeuwen , Renatus Gerardus Klaver , Martijn Robert Hamers
- Applicant: Emiel Jozef Melanie Eussen , Engelbertus Antonius Fransiscus Van Der Pasch , Robbert Edgar Van Leeuwen , Renatus Gerardus Klaver , Martijn Robert Hamers
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/58
Abstract:
An encoder-type measurement system is configured to measure a position dependent signal of a movable object. The measurement system includes a light source and a sensor. The light source and the sensor are mounted on one of the movable object or a substantially stationary frame. The measurement system also includes a reference object that includes a grating or grid mounted on the other of the movable object or the substantially stationary frame. The light source is configured to emit a light beam towards the reference object. The sensor is configured to detect light of the light source reflected by the reference object. The measurement system also includes an error detector capable of detecting errors in or on the grating or grid of the sensor target object during a continuous production process.
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