Invention Grant
- Patent Title: Fluid handling structure, lithographic apparatus and device manufacturing method, involving gas supply
- Patent Title (中): 流体处理结构，光刻设备和装置制造方法，涉及供气
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Application No.: US12886956Application Date: 2010-09-21
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Publication No.: US08614784B2Publication Date: 2013-12-24
- Inventor: Michel Riepen , Nicolaas Rudolf Kemper , Johannes Catharinus Hubertus Mulkens , Rogier Hendrikus Magdalena Cortie , Ralph Joseph Meijers , Fabrizio Evangelista
- Applicant: Michel Riepen , Nicolaas Rudolf Kemper , Johannes Catharinus Hubertus Mulkens , Rogier Hendrikus Magdalena Cortie , Ralph Joseph Meijers , Fabrizio Evangelista
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/32
Abstract:
A fluid handling structure is provided for a lithographic apparatus having at a boundary between a space containing immersion fluid and a region external to the fluid handling structure, a plurality of openings arranged in a first line, a first gas knife device having an aperture in a second line, one or more openings in a third line and a second gas knife device having an aperture in a fourth line.
Public/Granted literature
- US20110090472A1 FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2011-04-21
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