Invention Grant
- Patent Title: Method for performing pattern decomposition based on feature pitch
- Patent Title (中): 基于特征间距进行图案分解的方法
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Application No.: US13170126Application Date: 2011-06-27
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Publication No.: US08615126B2Publication Date: 2013-12-24
- Inventor: Jung Chul Park
- Applicant: Jung Chul Park
- Applicant Address: NL Veldhoven
- Assignee: ASML Masktools B.V.
- Current Assignee: ASML Masktools B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G06K9/00
- IPC: G06K9/00

Abstract:
The present invention discloses a method for decomposing a target pattern containing features to be printed on a wafer, into multiple patterns, the features having a plurality of patterns within a minimum pitch for processes utilized to image the target pattern. The method includes superposing a predefined kernel over a pixel, and moving the kernel from one pixel to another, the pixels representing the sub-patterns of the target pattern. Polarity of the kernel may be reversed when the pixel has a stored intensity value that is negative.
Public/Granted literature
- US20110317908A1 Method for Performing Pattern Decomposition Based on Feature Pitch Public/Granted day:2011-12-29
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