Invention Grant
- Patent Title: Method and system for attenuating a wavelength shifting source
- Patent Title (中): 用于衰减波长移位源的方法和系统
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Application No.: US12943683Application Date: 2010-11-10
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Publication No.: US08621759B2Publication Date: 2014-01-07
- Inventor: Christopher Jacob Reimer
- Applicant: Christopher Jacob Reimer
- Applicant Address: CA Ottawa, Ontario
- Assignee: Raytheon Canada Limited
- Current Assignee: Raytheon Canada Limited
- Current Assignee Address: CA Ottawa, Ontario
- Agency: Daly, Crowley, Mofford & Durkee, LLP
- Main IPC: G02B27/34
- IPC: G02B27/34 ; G02B27/10 ; F41G1/34

Abstract:
An apparatus comprises a light source which produces a first radiation within a first wavelength range and which produces a second radiation within a second wavelength range when a property of the light source is changed. The apparatus further comprises an optical device which receives the first radiation and attenuates the first radiation to emit a first attenuated radiation having a first perceived brightness. The optical device also receives the second radiation and attenuates the second radiation to emit a second attenuated radiation having a second perceived brightness. The first and second perceived brightnesses are approximately equal.
Public/Granted literature
- US20120110887A1 Method and System for Attenuating A Wavelength Shifting Source Public/Granted day:2012-05-10
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