Invention Grant
- Patent Title: Head cleaning method and head cleaning apparatus
- Patent Title (中): 头部清洁方法和头部清洁装置
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Application No.: US13666789Application Date: 2012-11-01
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Publication No.: US08622514B2Publication Date: 2014-01-07
- Inventor: Hiroshi Inoue
- Applicant: Fujifilm Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2009-085584 20090331; JP2009-085585 20090331; JP2009-085586 20090331
- Main IPC: B41J2/165
- IPC: B41J2/165

Abstract:
A head cleaning method of wiping and cleaning a nozzle surface of a head with a band-shaped liquid absorbing body by, while pressing and abutting a pressing member on which the liquid absorbing body that travels is wrapped against the nozzle surface of the head, sliding the pressing member over the nozzle surface of the head, includes: a first cleaning step of wiping and cleaning the nozzle surface of the head with a non-wet region of the liquid absorbing body; a wet region forming step of forming a wet region on the liquid absorbing body; and a second cleaning step of wiping and cleaning the nozzle surface of the head with the wet region of the liquid absorbing body.
Public/Granted literature
- US20130057613A1 Head Cleaning Method and Head Cleaning Apparatus Public/Granted day:2013-03-07
Information query
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