Invention Grant
- Patent Title: Vacuum processing system
- Patent Title (中): 真空加工系统
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Application No.: US12816750Application Date: 2010-06-16
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Publication No.: US08623457B2Publication Date: 2014-01-07
- Inventor: Kengo Ashizawa
- Applicant: Kengo Ashizawa
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2005-342082 20051128
- Main IPC: C23C16/00
- IPC: C23C16/00 ; B05C5/00

Abstract:
A vacuum processing system includes a transfer chamber configured to form a vacuum atmosphere through which a target object is transferred. A transfer mechanism is disposed in the transfer chamber and configured to transfer the target object. A process chamber is connected to the transfer chamber through a first gate valve and configured to perform a process on the target object within a vacuum atmosphere. A first exhaust port is formed in a bottom of the transfer chamber at the foot of the first gate valve. A first gas exhaust section is connected to the first exhaust port and configured to exhaust gas inside the transfer chamber.
Public/Granted literature
- US20100256809A1 VACUUM PROCESSING SYSTEM Public/Granted day:2010-10-07
Information query
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