Invention Grant
US08623478B2 Organic semiconductor ink composition and method for forming organic semiconductor pattern using the same
有权
有机半导体油墨组合物和使用其形成有机半导体图案的方法
- Patent Title: Organic semiconductor ink composition and method for forming organic semiconductor pattern using the same
- Patent Title (中): 有机半导体油墨组合物和使用其形成有机半导体图案的方法
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Application No.: US13262310Application Date: 2010-03-30
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Publication No.: US08623478B2Publication Date: 2014-01-07
- Inventor: Masayoshi Koutake , Masanori Kasai , Hisatomo Yonehara , Kiyofumi Takano
- Applicant: Masayoshi Koutake , Masanori Kasai , Hisatomo Yonehara , Kiyofumi Takano
- Applicant Address: JP Tokyo
- Assignee: DIC Corporation
- Current Assignee: DIC Corporation
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2009-085501 20090331
- International Application: PCT/JP2010/055661 WO 20100330
- International Announcement: WO2010/113931 WO 20101007
- Main IPC: B41M5/00
- IPC: B41M5/00

Abstract:
Provided is an ink that is the most suitable for a method for forming an organic transistor by transferring a pattern using a liquid-repellent transfer substrate, for example, a microcontact printing method or a reverse printing method. Specifically, provided is an organic semiconductor ink composition which can provide a uniform ink coating film on a surface of a liquid-repellent transfer substrate and which can provide a dry ink film or a semi-dry ink film capable of being easily transferred from the transfer substrate to a transfer-receiving base material. Also provided is a method for forming an organic semiconductor pattern of an organic transistor, the method using the organic semiconductor ink composition. The organic semiconductor ink composition used for obtaining a desired pattern by transferring an ink layer formed on a liquid-repellent transfer substrate to a printing base material contains an organic semiconductor, an organic solvent, and a fluorine-based surfactant.
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