Invention Grant
- Patent Title: Graphite material and method for manufacturing the same
- Patent Title (中): 石墨材料及其制造方法
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Application No.: US12448411Application Date: 2007-12-21
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Publication No.: US08623510B2Publication Date: 2014-01-07
- Inventor: Akiyoshi Takeda , Masayuki Ito
- Applicant: Akiyoshi Takeda , Masayuki Ito
- Applicant Address: JP Osaka
- Assignee: Toyo Tanso Co., Ltd.
- Current Assignee: Toyo Tanso Co., Ltd.
- Current Assignee Address: JP Osaka
- Agency: Kubovcik & Kubovcik
- Priority: JP2006-345937 20061222
- International Application: PCT/JP2007/074647 WO 20071221
- International Announcement: WO2008/078679 WO 20080703
- Main IPC: C01B31/00
- IPC: C01B31/00 ; C01B31/04 ; C01B31/30

Abstract:
Provided are a graphite material, which has excellent bonding characteristics to semiconductor and efficiently dissipates heat generated from the semiconductor, and a method for manufacturing such material. The graphite material is provided by adding at least two kinds of elements selected from among silicon, zirconium, calcium, titanium, chromium, manganese, iron, cobalt, nickel, calcium, yttrium, niobium, molybdenum, technetium, ruthenium and compounds containing such elements, and by performing heat treatment. The graphite material is characterized in having a thickness of the 112 face of the graphite crystal of 15 nm or more by X-ray diffraction, and an average heat conductivity of 250 W/(m·K) or more in the three directions of the X, Y and Z axes.
Public/Granted literature
- US20100009193A1 GRAPHITE MATERIAL METHOD FOR MANUFACTURING THE SAME Public/Granted day:2010-01-14
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